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Generation and Recombination-Introduction to Microelectronic Circuits-Lecture 18 Slides-Electrical Engineering, Slides of Microelectronic Circuits

Generation and Recombination, Generation, Recombination, Generation Rates, Recombination Rates, Thermal Recombination, Optical Recombination, Carrier Scattering, Carrier Drift, Drift Velocity, Carrier Mobility, Current Density, Electrical Conductivity, Electrical Resistivity, Sheet Resistance, Velocity Saturation

Typology: Slides

2011/2012

Uploaded on 02/27/2012

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Download Generation and Recombination-Introduction to Microelectronic Circuits-Lecture 18 Slides-Electrical Engineering and more Slides Microelectronic Circuits in PDF only on Docsity! 1 Lecture 18, Slide 1EECS40, Fall 2003 Prof. King Lecture #18 OUTLINE – Generation and recombination – Charge-carrier transport in silicon – Resistivity as a function of doping Reference Texts on reserve in Engr. Library • Howe & Sodini Chapter 2.1: Pure semiconductors Chapter 2.2: Generation, recombination, thermal equilibrium Chapter 2.3: Doping Chapter 2.4: Carrier Transport Chapter 2.6: IC Resistors • Schwarz and Oldham Chapter 13: Semiconductor Devices Lecture 18, Slide 2EECS40, Fall 2003 Prof. King Generation • We have seen that conduction (mobile) electrons and holes can be created in pure (intrinsic) silicon by thermal generation. – Thermal generation rate increases exponentially with temperature T • Another type of generation process which can occur is optical generation – The energy absorbed from a photon frees an electron from covalent bond • In Si, the minimum energy required is 1.1eV, which corresponds to ~1 µm wavelength (infrared region) • Note that conduction electrons and holes are continuously generated, if T > 0 2 Lecture 18, Slide 3EECS40, Fall 2003 Prof. King Recombination • When a conduction electron and hole meet, each one is eliminated. The energy lost by the conduction electron (when it “falls” back into the covalent bond) can be released in 2 ways: 1. to the semiconductor lattice (vibrations) “thermal recombination” semiconductor is heated 2. to photon emission “optical recombination” light is emitted • Optical recombination is negligible in Si. It is significant in compound semiconductor materials, and is the basis for light-emitting diodes and laser diodes. Lecture 18, Slide 4EECS40, Fall 2003 Prof. King Generation and Recombination Rates • The generation rate is dependent on temperature T, but it is independent of n and p : • The recombination rate is proportional to both n and p: • In steady state, a balance exists between the generation and recombination rates. • A special case of the steady-state condition is thermal equilibrium: no optical or electrical sources opticalthermal GTGG += )( )(2 Tnnp i= )( TfnpRG =⇒= npR ∝ 5 Lecture 18, Slide 9EECS40, Fall 2003 Prof. King Electrical Conductivity σ When an electric field is applied, current flows due to drift of mobile electrons and holes: EqnnvqJ nnn µ=−= )(electron current density: hole current density: EqppvqJ ppp µ=+= )( total current density: pn pnpn qpqn EJ EqpqnJJJ µµσ σ µµ +≡ = +=+= )( conductivity Lecture 18, Slide 10EECS40, Fall 2003 Prof. King (Units: ohm-cm) Electrical Resistivity ρ pn qpqn µµσ ρ + =≡ 11 for n-type mat’l nqnµ ρ 1≅ for p-type mat’l pqpµ ρ 1≅ Note: This plot does not apply for compensated material (doped with both donors and acceptors) 6 Lecture 18, Slide 11EECS40, Fall 2003 Prof. King Consider a Si sample doped with 1016/cm3 Boron. What is its resistivity? Answer: NA = 1016/cm3 , ND = 0 (NA >> ND p-type) p ≈ 1016/cm3 and n ≈ 104/cm3 Example [ ] cm 4.1)450)(10)(106.1( 11 11619 −Ω=×= ≅ + = −− ppn qpqpqn µµµ ρ From µ vs. ( NA + ND ) plot Lecture 18, Slide 12EECS40, Fall 2003 Prof. King The sample is converted to n-type material by adding more donors than acceptors, and is said to be “compensated”. Consider the same Si sample, doped additionally with 1017/cm3 Arsenic. What is its resistivity? Answer: NA = 1016/cm3, ND = 1017/cm3 (ND>>NA n-type) n ≈ 9x1016/cm3 and p ≈ 1.1x103/cm3 [ ] cm 10.0)700)(109)(106.1( 11 11619 −Ω=××= ≅ + = −− npn qnqpqn µµµ ρ Example (cont’d) 7 Lecture 18, Slide 13EECS40, Fall 2003 Prof. King R ≅ 2.6Rs Sheet Resistance Rs Rs is the resistance when W = L t R W LR Wt LR ss ρρ ≡⇒== (Unit: ohms/square) R = Rs/2 R = 2Rs R = 3Rs • The Rs value for a given layer in an IC technology is used – for design and layout of resistors – for estimating values of parasitic resistance in a circuit R = Rs Metallic contacts Lecture 18, Slide 14EECS40, Fall 2003 Prof. King At high electric fields, the average velocity of carriers is NOT proportional to the field; it saturates at ~107 cm/sec for both electrons and holes: Velocity Saturation
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